Member Detail
Product
Leads
SupplySolar Wafer Texturing Wet Chemical Processing Eq;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplySilicon Ingot Cleaning System;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
Supply developing machine;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplySloar Wafer PSG Decoating Wet Chemical Processin.Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplySolar Wafer Wet bench;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyWafer Manual Wet bench;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyChemical Delivery/Disp;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyWet Processing Systems For Wet Etching, Wafer.Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
Supply Plasma Etching;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyWafer Dryer;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyAchiever Wet Bench..Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyIPA spray drying washing machine;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyIn-Line Wafer Etching;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyWafer Wet Bench;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
SupplyPSG Removal Wet Proces;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
Lead Description:
)
Description
Product Description�� 1 Applied in wafer�� s rinsing and drying; 2 Spin-rinsing and drying, N2 drying, chamber drying, Auto door opening after processing finished, auto processing flow including working condition display and fault alarm; 3 Material: Stainless steel; Features and benefits: A. Airproof; B Spin device through exact dynamic& static balance testing; Ensure system balance and reduce shock; C Auto control mode; D Steady, safety and reliable; E Electricity defend; F
Product Description�� 1 Applied in wafer�� s rinsing and drying; 2 Spin-rinsing and drying, N2 drying, chamber drying, Auto door opening after processing finished, auto processing flow including working condition display and fault alarm; 3 Material: Stainless steel; Features and benefits: A. Airproof; B Spin device through exact dynamic& static balance testing; Ensure system balance and reduce shock; C Auto control mode; D Steady, safety and reliable; E Electricity defend; F
Lead Name :
SupplyWafer Dryer;Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
Model/Article No :
14668756612476823335_dorcas4184
Category :
Television
Price :
INR
0.00
Related Searches :
semiconductor wet proces ,
wafer wet bench ,
solar wafer cleaning equ ,
Packing :
Negotiable
Manufacturer :
Suzhou CSE Semiconductor Equipment Technology Co.,Ltd.
Other details :
We provide innovative, professional wet
Suzhou CSE Semiconductor Equipment Technology Co.,Ltd.
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FREE MEMBER
This member's information has NOT been authenticated or verified by . Only our Gold and trust Members have completed an Authentication and Verification procedure conducted by .
Contact Details
Address
5E,KuaChun Industry Park,WeiTing Town,SIP,SuZhou 215122,China,Suzhou
City :
Suzhou
Country :
China
Postal Code :
215000
Phone
0086-512-50175920
Mobile
18913575053